Molybdenum Alloy Sputtering Target
With the improvement of the electronics industry in terms of overall performance and trial environmental requirements, molybdenum sputtering targets were running into problems with corrosion (discoloration) and adhesion (film peeling). To prevent that, we have added tungsten, vanadium, niobium, tantalum, and other alloy elements into the molybdenum target material, so that various properties (impedance ratio, stress, and corrosion resistance) of the sputtered films all meet a balanced state.
Our molybdenum alloy sputtering targets have a molybdenum content of 99.95%. We have planar targets and rotatable targets available for customers to choose from, and each one's specifications can be customized according to customer needs.
Purity: 99.95% Min.
Density: 98% Min.
Specification: As per customer's request
Usage: TP Industry
Purity: 99.95% Min.
Density: 98% Min.
Range: Diameter 100-300mm, Max. Length 5000mm
Specification: As per customer's request
Usage: TP Industry
